|本期目录/Table of Contents|

[1]秦利军,龚婷,闫宁,等.原子层沉积技术在含能材料表面修饰中的应用研究进展[J].火炸药学报,2019,42(5):425-431.[doi:10.14077/j.issn.1007-7812.2019.05.001]
 QIN Li-jun,GONG Ting,YAN Ning,et al.Research Progress on Application of Atomic Layer Deposition in Surface Fabrication of Energetic Materials[J].,2019,42(5):425-431.[doi:10.14077/j.issn.1007-7812.2019.05.001]
点击复制

原子层沉积技术在含能材料表面修饰中的应用研究进展()
     
分享到:

《火炸药学报》[ISSN:1007-7812/CN:61-1310/TJ]

卷:
42卷
期数:
2019年第5期
页码:
425-431
栏目:
出版日期:
2019-10-31

文章信息/Info

Title:
Research Progress on Application of Atomic Layer Deposition in Surface Fabrication of Energetic Materials
作者:
秦利军 龚婷 闫宁 李建国 惠龙飞 郝海霞 冯昊
1. 西安近代化学研究所, 陕西 西安 710065;
2. 西安近代化学研究所燃烧与爆炸技术重点实验室, 陕西 西安 710065
Author(s):
QIN Li-jun GONG Ting YAN Ning LI Jian-guo HUI Long-fei HAO Hai-xia FENG Hao
1. Xi’an Modern Chemistry Research Institute, Xi’an 710065, China;
2. Science and Technology on Combustion and Explosion Laboratory, Xi’an Modern Chemistry Research Institute, Xi’an 710065, China
关键词:
应用化学原子层沉积(ALD)分子层沉积(MLD)含能材料表面性质表面修饰
Keywords:
applied chemistryatomic layer deposition (ALD)molecular layer deposition (MLD)energetic materialssurface propertiessurface fabrication
分类号:
TJ55;O69
DOI:
10.14077/j.issn.1007-7812.2019.05.001
文献标志码:
-
摘要:
介绍了原子层沉积技术的原理和特点,并对比传统物理及化学气相沉积薄膜制备工艺,总结了原子层沉积技术在含能材料合成及表面修饰改性方面所具有的薄膜厚度精确可控、工作温度低和大面积及三维均匀性方面的优势。综述了原子层沉积技术在亚稳态分子间复合物合成,降低金属粉和炸药感度,以及提高铝粉、氢化铝和ADN稳定性等方面的研究进展。评述了原子层沉积技术在含能材料精确合成及表面修饰中的主要作用及未来发展方向。附参考文献29篇。
Abstract:
The principles and characteristics of the atomic layer deposition (ALD) technology are briefly described. In comparison with the traditional vapor deposition technologies, ALD boasts its unique capabilities in precise film thickness control, low temperature deposition, large area and three-dimensional uniformity. These features make ALD a promising technology for preparing the energetic composites and fabricating the surfaces of energetic materials. The latest research progresses on the applications of ALD in the preparation and modification of energetic materials are summarized, including synthesis of metastable intermolecular composites (MIC), de-sensitization of metal fuels and explosives, and stability improvement of aluminum, aluminum hydride and ammonium dinitramide (ADN). The importance and prospects of ALD in precise synthesis and surface fabrication of energetic materials are evaluated. With 29 references.

参考文献/References:

[1] GEORGE S M. Atomic layer deposition:an overview[J]. Chemical Reviews, 2010, 110:111-131.
[2] LESKEL?M, RITALA M. Atomic layer deposition chemistry:recent developments and future challenges[J]. Angewandte Chemie International Edition, 2003, 42:5548-5554.
[3] LEE B H, YOON B, ABDULAGATOV A I, et al. Growth and properties of hybrid organic-inorganic metalcone films using molecular layer deposition techniques[J]. Advanced Functional Materials, 2013, 23:532-546.
[4] SINGH R, BAPAT R, QIN L J, et al. Atomic layer deposited (ALD) TiO2 on fibrous nano-silica (KCC-1) for photocatalysis:nanoparticle formation and size quantization effect[J]. ACS Catalysis, 2016, 6:2770-2784.
[5] 朱琳,李爱东.原子层沉积技术制备金属材料的进展与挑战[J].微纳电子技术,2015,52(2):113-122. ZHU Lin, LI Ai-dong. Advances and challenges of metal materials prepared by atomic layer deposition[J]. Micronanoelectronic Technology, 2015, 52(2):113-122.
[6] 施云波,于明岩,饶志鹏,等.原子层沉积技术及其创新应用[J].纳米技术与精密工程,2014,12(5):328-333. SHI Yun-bo, YU Ming-yan, RAO Zhi-peng, et al. Atomic layer deposition technology and its innovative applications[J]. Nanotechnology and Precision Engineering, 2014, 12(5):328-333.
[7] 黄钰,宋珂琛,冯昊.原子层沉积技术及其在粉体材料上的应用进展[J].化工新型材料,2016,44(5):16-18. HUANG Yu, SONG Ke-chen, FENG Hao. Atomic layer deposition and its development of the application on the powder materials[J]. New Chemical Materials, 2016, 44(5):16-18.
[8] MARICHY C, BECHELANY M, PINNA N. Atomic layer deposition of nanostructured materials for energy and environmental applications[J]. Advanced Materials, 2012, 24:1017-1032.
[9] FERGUSON J D, BUECHLER K J, WEIMER A W, et al. SnO2 atomic layer deposition on ZrO2 and Al nanoparticles:pathway to enhanced thermite materials[J]. Powder Technology, 2005, 156:154-163.
[10] 李惠琴,陈晓勇,王成,等.原子层沉积技术在微纳器件中的应用研究进展[J].表面技术,2015,44(2):60-67. LI Hui-qin, CHEN Xiao-yong, WANG Cheng, et al. Progress in application research of atomic layer deposition in micro-nano devices field[J]. Surface Technology, 2015, 44(2):60-67.
[11] PONRAJ J S, ATTOLINI G, BOSI M. Review on atomic layer deposition and applications of oxide thin films[J]. Critical Reviews in Solid State and Materials Sciences, 2013, 38:203-233.
[12] MIIKKULAINEN V, LESKEL ? M, RITALA M, et al. Crystallinity of inorganic films grown by atomic layer deposition:overview and general trends[J]. Journal of Applied physics, 2013, 113:021301(1-102).
[13] ELAM J W, GRONER M D, GEORGE S M. Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition[J]. Reviews on Scientific Instruments, 2002, 73(8):2981-2987.
[14] 刘荣正,刘马林,邵友林,等.流化床-化学气相沉积技术的应用及研究进展[J].化工进展,2016,35(5):1263-1272. LIU Rong-zheng, LIU Ma-lin, SHAO You-lin, et al. Application and research progress of fluidized bed-chemical vapor deposition technology[J]. Chemical Industry and Engineering Progress, 2016, 35(5):1263-1272.
[15] 吴笛.物理气相沉积技术的研究进展与应用[J].机械工程与自动化,2011(4):214-216. WU Di. Application and development of physical vapor deposition technology[J]. Mechanical Engineering & Automation, 2011(4):214-216.
[16] 李茂果,杜自卫,廖宏.HMX颗粒的气相沉积包覆研究[J]. 真空,2013,50(6):23-26. LI Mao-guo, DU Zi-wei, LIAO Hong. Study of the HMX particles coated by vapor deposition[J]. Vacuum, 2013, 50(6):23-26.
[17] SUNDBERG P, KARPPINEN M. Organic and inorganic-organic thin film structures by molecular layer deposition:a review[J]. Beilstein Journal of Nanotechnology, 2014, 5:1104-1136.
[18] MARIN L, GAO Y Z, VALLET M, et al. Performance enhancement via incorporation of ZnO nanolayers in energetic Al:CuO multilayers[J]. Langmuir, 2017, 33(41):11086-11093.
[19] QIN L J, GONG T, HAO H X, et al. Core-shell-structured nanothermites synthesized by atomic layer deposition[J]. Journal of Nanoparticle Research, 2013, 15:2150(1-15).
[20] QIN L J, YAN N, LI J G, et al. Enhanced energy performance from core-shell structured Al@Fe2O3 nanothermite fabricated by atomic layer deposition[J]. RSC Advances, 2017, 7:7188-7197.
[21] YAN N, QIN L J, HAO H X, et al. Iron oxide/aluminum/graphene energetic nanocomposites synthesized by atomic layer deposition:enhanced energy release and reduced electrostatic ignition hazard[J]. Applied Surface Science, 2017, 408:51-59.
[22] YAN N, QIN L J, LI J G, et al. Atomic layer deposition of Iron oxide on reduced grapheme oxide and its catalytic activity in the thermal decomposition of ammonium perchlorate[J]. Applied Surface Science, 2018, 451:155-161.
[23] 秦利军,龚婷,郝海霞,等.原子层沉积氧化物包覆层对奥克托金感度的影响[J].高等学校化学学报,2015,36(3):420-427. QIN Li-jun, GONG Ting, HAO Hai-xia, et al. Influences of metal oxide encapsulation by atomic layer deposition on the sensitivities of octogen[J]. Chemical Journal of Chinese Universities, 2015, 36(3):420-427.
[24] QIN L J, YAN N, HAO H X, et al. Surface engineering of zirconium particles by molecular layer deposition:Significantly enhanced electrostatic safety at minimum loss of the energy density[J]. Applied Surface Science, 2018, 436:548-555.
[25] QIN Li-jun, GONG Ting, LI Jian-guo, et al. Tuning ignition and energy release properties of Zirconium powder by atomic layer deposited metal oxide coatings[J]. Journal of Hazardous Materials, 2019,378:120655(1-8)
[26] 庞维强,樊学忠,赵凤起.含硼富燃料固体火箭推进剂技术[M].北京:国防工业出版社,2016. PANG Wei-qiang, FAN Xue-zhong, ZHAO Feng-qi. Boron-based Fuel Rich Solid Rocket Propellant Technology[M]. Beijing:National Defense Induatry Press, 2016.
[27] CHEN R, DUAN C L, LIU X, et al. Surface passivation of aluminum hydride particles via atomic layer deposition[J]. Journal of Vacuum Science and Technology A, 2017, 35(3):03E111(1-6).
[28] CHEN R, QU K, LI J W, et al. Ultrathin zirconia passivation and stabilization of aluminum nanoparticles for energetic nanomaterials via atomic layer deposition[J]. ACS Applied Nano Materials, 2018, 1(10):5500-5506.
[29] 龚婷,秦利军,严蕊,等.原子层沉积技术合成氧化铝薄膜包覆二硝酰胺铵[J].无机材料学报,2014,29(8):869-874. GONG Ting, QIN Li-jun, YAN Rui, et al. Alumina thin film coated ammonium dinitramide fabricated by atomic layer deposition[J]. Journal of Inorganic Materials, 2014, 29(8):869-874.

相似文献/References:

[1]赵孝彬,蒲远远,陈教国,等.武器信息化条件下火炸药发展策略分析[J].火炸药学报,,():7.
 ZHAO Xiao-bin,PU Yuan-yuan,CHEN Jiao-guo,et al.The Analysis about Developed Strategy of Propellant and Explosive in the Circumstances of Weapon Informationization[J].,,(5):7.
[2]赵孝彬,蒲远远,陈教国,等.NEPE推进剂的燃烧转爆轰特性[J].火炸药学报,2007,30(1):4.
[3]肖正刚,应三九,徐复铭,等.发射药的等离子体点火燃烧中止试验研究[J].火炸药学报,2007,30(1):17.
[4]张晓宏,莫红军.下一代战术导弹固体推进剂研究进展[J].火炸药学报,2007,30(1):24.
[5]李 鹏,刘有智,李裕,等.用旋转填料床治理火炸药厂的氮氧化物尾气[J].火炸药学报,2007,30(1):67.
[6]周润强,刘德新,曹端林,等.硝酸脲与RDX共晶炸药研究[J].火炸药学报,2007,30(2):49.
[7]石 飞,王庆法,张香文,等.1,2-丙二醇二硝酸酯的绿色合成[J].火炸药学报,2007,30(2):75.
[8]马海霞,宋纪蓉,胡荣祖.3-硝基-1,2,4-三唑-5-酮及其盐的研究概述[J].火炸药学报,2006,29(6):9.
[9]陆明,周新利.RDX的TNT包覆钝感研究[J].火炸药学报,2006,29(6):16.
[10]刘有智,刁金祥,王贺,等.超重力-臭氧法处理TNT红水的试验研究[J].火炸药学报,2006,29(6):41.

备注/Memo

备注/Memo:
收稿日期:2018-10-27;改回日期:2019-02-26。
基金项目:装备预研重点实验室基金项目
作者简介:秦利军(1985-),男,硕士,副研究员,从事原子层沉积含能材料表面工程技术研究。E-mail:qinlijun.408@163.com
通讯作者:冯昊(1979-),男,博士,研究员,从事原子层沉积表面工程技术研究。E-mail:fenghao98@hotmail.com
更新日期/Last Update: 1900-01-01